| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a graphene structure having a homogeneous graphene film on an insulating film.SOLUTION: On a given substrate 2, at least an insulating film layer 3 including silicon and a catalytic metal layer 4 are laminated sequentially. On these layers, carbon which is formed by decomposition reaction of a carbon compound is supplied. After the formation of a graphite layer 5, this graphite is dissolved in the catalytic metal through heat treatment. This graphite is diffused and deposited to an interface to the insulating film layer 3. Furthermore, the catalytic metal layer 4 is removed, and then the graphene film 6 is formed on the insulating film layer 3. |
