发明名称 SYSTEM AND METHOD FOR SEALING A VAPOR DEPOSITION SOURCE
摘要 A system and method for movably sealing a vapor deposition source is described. One embodiment includes a system for coating a substrate, the system comprising a deposition chamber; a vapor pocket located within the deposition chamber; and an at least one movable seal, wherein the at least one movable seal is configured to form a first seal with a first portion of a substrate, and wherein the first seal is configured to prevent a vapor from leaking past the first portion of the substrate out of the vapor pocket. In some embodiments, the movable seal may comprise a first flange, wherein the first flange forms a wall of the vapor pocket; and a second flange, wherein the second flange is configured to be movably disposed within a first groove of the source block.
申请公布号 US2013340243(A1) 申请公布日期 2013.12.26
申请号 US201313912820 申请日期 2013.06.07
申请人 COLORADO STATE UNIVERSITY RESEARCH FOUNDATION 发明人 ENZENROTH ROBERT A.;LOBUE JOSEPH D.;KNIPP LAWRENCE J.
分类号 C23C16/44 主分类号 C23C16/44
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