发明名称 |
COMPOUND EXCELLENT IN SELECTIVE ACCUMULATION TO UNSTABLE PLAQUE |
摘要 |
PROBLEM TO BE SOLVED: To provide a compound excellent in selective accumulation to an unstable plaque.SOLUTION: There is disclosed a compound expressed by formula (1) or a salt thereof. In the formula, Ais oxygen or an NH group; Rand Rare hydrogen or a radioactive halogen substituent, provided that only either of Rand Ris the radioactive halogen substituent; Ris hydrogen or a methoxy group. |
申请公布号 |
JP2013256491(A) |
申请公布日期 |
2013.12.26 |
申请号 |
JP20130086848 |
申请日期 |
2013.04.17 |
申请人 |
KYOTO UNIV;NIHON MEDI PHYSICS CO LTD |
发明人 |
SAJI HIDEO;ONO MASAHIRO;TENMA TAKASHI;SEKI IKUYA |
分类号 |
C07D487/04;A61K51/00;A61P9/00 |
主分类号 |
C07D487/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|