发明名称 COMPOUND EXCELLENT IN SELECTIVE ACCUMULATION TO UNSTABLE PLAQUE
摘要 PROBLEM TO BE SOLVED: To provide a compound excellent in selective accumulation to an unstable plaque.SOLUTION: There is disclosed a compound expressed by formula (1) or a salt thereof. In the formula, Ais oxygen or an NH group; Rand Rare hydrogen or a radioactive halogen substituent, provided that only either of Rand Ris the radioactive halogen substituent; Ris hydrogen or a methoxy group.
申请公布号 JP2013256491(A) 申请公布日期 2013.12.26
申请号 JP20130086848 申请日期 2013.04.17
申请人 KYOTO UNIV;NIHON MEDI PHYSICS CO LTD 发明人 SAJI HIDEO;ONO MASAHIRO;TENMA TAKASHI;SEKI IKUYA
分类号 C07D487/04;A61K51/00;A61P9/00 主分类号 C07D487/04
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