| 摘要 |
PROBLEM TO BE SOLVED: To solve such problem that in conventional resist compositions, line edge roughness (LER) in resist pattern production is not always sufficiently satisfied.SOLUTION: There is disclosed a salt expressed by formula (I), where in the formula, Qand Qeach independently represents a fluorine atom or a 1-6C perfluoroalkyl group; Lrepresents a 1-17C bivalent saturated hydrocarbon group, the hydrogen atom contained in the saturated hydrocarbon group may be substituted by a fluorine atom or hydroxy group, and the methylene group constituting the saturated hydrocarbon group may be replaced with an oxygen atom or carbonyl group; a ring Wrepresents a ring of cyclic carbonic acid ester structure; and Zrepresents an organic cation. |
