| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposited film forming apparatus including rotating members.SOLUTION: A vapor deposited film forming apparatus is provided which includes a plurality of substrate supporting parts. A plurality of rotating members for respectively rotating a plurality of substrates are arranged on each of the substrate supporting parts. Each rotating member is rotated on the substrate supporting part by a gas-foil method. A cover is installed on a portion on the substrate supporting part, other than portions where the plurality of rotating members are positioned. A gap, through which a predetermined gas used in the gas-foil method is discharged, is formed between the substrate supporting part and the cover.SELECTED DRAWING: Figure 3 |
