发明名称 System for monitoring failure of substrate processing apparatus, and method for monitoring failure of substrate processing apparatus
摘要 Disclosed is a failure monitoring system for monitoring a failure of a substrate processing apparatus that performs a predetermined processing on a substrate to be processed, the failure monitoring system including: an alarm collecting unit configured to collects alarms issued from the substrate processing apparatus; and an analyzing unit configured to analyze the alarms collected by the alarm collecting unit and display, as an image, an alarm issuing frequency in each monitoring period on a two-dimensional space, of which one axis represents an alarm ID that specifies an alarm issuing area and another axis represents a predetermined monitor period.
申请公布号 US9412256(B2) 申请公布日期 2016.08.09
申请号 US201314387668 申请日期 2013.03.14
申请人 TOKYO ELECTRON LIMITED 发明人 Namioka Ichiro
分类号 G08B21/00;G08B21/18;H01L21/67 主分类号 G08B21/00
代理机构 Rothwell, Figg, Ernst & Manbeck, P.C. 代理人 Rothwell, Figg, Ernst & Manbeck, P.C.
主权项 1. A failure monitoring system for monitoring a failure of a substrate processing apparatus that performs a predetermined processing on a substrate to be processed, the failure monitoring system comprising: an alarm collecting unit configured to collect alarms issued from the substrate processing apparatus; and an analyzing unit configured to analyze the alarms collected by the alarm collecting unit and display, as an image, an alarm issuing frequency in each monitoring period on a two-dimensional space, of which one axis represents an alarm ID that specifies an alarm issuing area and another axis represents a predetermined monitor period thereby enabling a user to visually monitor both an alarm issuing tendency of the failure of the substrate processing apparatus for each of the predetermined monitor period and an inter-alarm tendency of the failure of the substrate processing apparatus within the predetermined monitor period.
地址 Tokyo JP