| 摘要 |
<p>A semiconductor device includes a substrate and a channel region which is formed above the substrate by printing, wherein a relationship L&gE;2a is satisfied where L is a channel length of the channel region and a is a minimum dimension among pattern dimensions and inter-pattern dimensions in the same layer as patterns that define the channel length L; and a relationship W&gE;2b is satisfied where W is a channel width of the channel region and b is a minimum dimension among pattern dimensions and inter-pattern dimensions in the same layer as a pattern that defines the channel width W.</p> |
