发明名称
摘要 <P>PROBLEM TO BE SOLVED: To accurately form a pattern without causing a pattern displacement even when the mechanism of a drawing device has an accuracy error. <P>SOLUTION: In the drawing device provided with an exposure head, a substrate for measurement is loaded on a drawing table and an exposure operation is performed on the basis of the pattern data of a reference spot pattern. Then, the position of a spot pattern is measured by a measuring instrument outside the device and the position coordinate data are stored in a memory in the drawing device. When drawing a pattern, the pattern data PD of a drawing pattern are divided into respective rectangular areas stipulated by the reference spot pattern, and closed area pattern data PD1 and PD2 of the respective rectangular areas LM1 and LM2 are corrected matched with deformed rectangular areas LN1 and LN2 deformed or displaced based on the measured position coordinates of the spot pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5379630(B2) 申请公布日期 2013.12.25
申请号 JP20090232228 申请日期 2009.10.06
申请人 发明人
分类号 H01L21/027;G03F9/00 主分类号 H01L21/027
代理机构 代理人
主权项
地址
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