发明名称 |
POLISHING PAD |
摘要 |
<p>A polishing pad comprising at least a polishing layer and a cushion layer, wherein a groove is formed on a polishing surface of the polishing pad, at least one of angles formed by the polishing surface and a side surface of the groove which continues to the polishing surface is 105-150° inclusive, and the cushion layer has a strain constant of 7.3×10 -6 to 4.4×10 -4 µm/Pa inclusive. The use of the polishing pad can achieve a purpose of preventing the fluctuation in a polishing rate while keeping the polishing rate at a high level.</p> |
申请公布号 |
EP2676771(A1) |
申请公布日期 |
2013.12.25 |
申请号 |
EP20120747173 |
申请日期 |
2012.02.08 |
申请人 |
TORAY INDUSTRIES, INC. |
发明人 |
TAKEUCHI, NANA;FUKUDA, SEIJI;OKUDA, RYOJI;KASAI, SHIGETAKA |
分类号 |
B24B37/26;B24B37/22;H01L21/304 |
主分类号 |
B24B37/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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