| 摘要 |
A method and device optimizing projection of a two-dimensional pattern onto a three-dimensional object surface. After defining an original curve on the two-dimensional pattern and a projection curve on the three-dimensional object surface, a point of the pattern is selected. The abscissa and ordinate of the projection of the selected point are determined according to the abscissa and ordinate of the selected point and first and second projection ratios, respectively. A projection plane, including the point of the projection curve determined by the abscissa of the projection of the selected point, is then determined. The projection of the selected point onto the three-dimensional object surface is determined according to the ordinate of the projection of the selected point, the intersection of the surface of the three-dimensional object with the plane of projection, and the projection curve. |
