发明名称 |
Laser-reflective mask and method for manufacturing same |
摘要 |
In a laser reflective mask and a fabricating method thereof, reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern. |
申请公布号 |
US8614032(B2) |
申请公布日期 |
2013.12.24 |
申请号 |
US201013147583 |
申请日期 |
2010.07.21 |
申请人 |
YOON HYEONG RYEOL;PARK NAE HWANG;KIM SU CHAN;LEE CHAN KOO;KIM YONG MUN;WI-A CORPORATION |
发明人 |
YOON HYEONG RYEOL;PARK NAE HWANG;KIM SU CHAN;LEE CHAN KOO;KIM YONG MUN |
分类号 |
G03F1/48;B29C35/08;G02B1/12;G03F1/00;G03F1/52;G03F1/58;G03F1/76;G03F1/80 |
主分类号 |
G03F1/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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