发明名称 Laser-reflective mask and method for manufacturing same
摘要 In a laser reflective mask and a fabricating method thereof, reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern.
申请公布号 US8614032(B2) 申请公布日期 2013.12.24
申请号 US201013147583 申请日期 2010.07.21
申请人 YOON HYEONG RYEOL;PARK NAE HWANG;KIM SU CHAN;LEE CHAN KOO;KIM YONG MUN;WI-A CORPORATION 发明人 YOON HYEONG RYEOL;PARK NAE HWANG;KIM SU CHAN;LEE CHAN KOO;KIM YONG MUN
分类号 G03F1/48;B29C35/08;G02B1/12;G03F1/00;G03F1/52;G03F1/58;G03F1/76;G03F1/80 主分类号 G03F1/48
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