摘要 |
<p>The present invention relates to a power supply member and an apparatus for treating a substrate which include: a lower side plate which has a plate shape and is formed with a conductor material, and has a lower side connected to a reactor electrically; a power control part which has a plate shape comprising a conductor piece including a conductor material partially and a non-conductor piece including a non-conductor material partially, and has a lower side touching an upper side of the lower side plate, and supplies power to the lower side plate periodically by rotating around a center axis; a power supply line supplying an RF power by having one end arranged on the upper side of the power control part; and a driving part providing rotation force to the power control part by being combined with the power control part. According to the present invention, the power control part can supply the RF power to the reactor by rotation without using a switch for on/off of the RF power, and thus it is possible to perform accurate power supply control mechanically.</p> |