ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSTION AND METHOD OF FORMING PATTERN USING THE SAME

摘要

Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below.