发明名称 |
NITRIDE-BASED HETEROJUCTION SEMICONDUCTOR DEVICE AND METHOD FOR THE SAME |
摘要 |
The present invention relates to a semiconductor device, especially to a nitride-based heterojuction semiconductor device and a method for manufacturing the same. The present invention includes a nitride semiconductor buffer layer; a barrier layer located on the buffer layer; a cap layer located on the barrier layer; a source electrode and a drain electrode located on the cap layer; a dielectric layer including gallium located between the source electrode and the drain electrode on the cap layer; and a gate electrode located between the source electrode and the drain electrode on the cap layer. |
申请公布号 |
KR20130138992(A) |
申请公布日期 |
2013.12.20 |
申请号 |
KR20120062601 |
申请日期 |
2012.06.12 |
申请人 |
LG ELECTRONICS INC.;SNU R&DB FOUNDATION |
发明人 |
JANG, TAE HOON;SEOK, O GYUN;HAN, MIN KOO |
分类号 |
H01L29/775;H01L21/335 |
主分类号 |
H01L29/775 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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