| 摘要 |
The present invention relates to an apparatus for isolating and discharging noxious gas of semiconductor equipment. The present invention safely performs a cleaning process by preventing the noxious gas which remains in a housing from being directly exposed to a worker when a cover is opened and a cleaning operation is performed after the completion of processes by forming a noxious gas isolation area and a noxious gas discharge path with a plurality of air induction plates in the housing which is placed in a chamber of the semiconductor equipment and forming an isolation layer by spraying air for isolating the noxious gas in the noxious gas isolation area. Also, the present invention minimizes processing stop time and improves processing efficiency by isolating and discharging the noxious gas which remains in the chamber and performing the cleaning process at the same time. |
