发明名称 GALLIUM NITRIDE BASED SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>Disclosed are a gallium nitride-based semiconductor capable of reducing a wafer's breakage and deformation with a decrease bow of the wafer and improving the uniformness of the outgoing wavelength and a method for manufacturing the same. The semiconductor device according to an embodiment of the present invention may include a silicon-based substrate doped with B and Ge simultaneously; a buffer layer on the silicon-based substrate; and a nitride laminated member on the buffer layer. Here, the doping concentration of B is higher than 10^19/cm^3 while the doping concentration of Ge can be higher than 10^19/cm^3.</p>
申请公布号 KR20130139107(A) 申请公布日期 2013.12.20
申请号 KR20120062862 申请日期 2012.06.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 TAK, YOUNG JO;KIM, JAE KYUN;KIM, JUN YOUN;LEE, JAE WON;CHOI, HYO JI
分类号 H01L33/12;H01L29/778;H01L33/32 主分类号 H01L33/12
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