发明名称 |
GALLIUM NITRIDE BASED SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<p>Disclosed are a gallium nitride-based semiconductor capable of reducing a wafer's breakage and deformation with a decrease bow of the wafer and improving the uniformness of the outgoing wavelength and a method for manufacturing the same. The semiconductor device according to an embodiment of the present invention may include a silicon-based substrate doped with B and Ge simultaneously; a buffer layer on the silicon-based substrate; and a nitride laminated member on the buffer layer. Here, the doping concentration of B is higher than 10^19/cm^3 while the doping concentration of Ge can be higher than 10^19/cm^3.</p> |
申请公布号 |
KR20130139107(A) |
申请公布日期 |
2013.12.20 |
申请号 |
KR20120062862 |
申请日期 |
2012.06.12 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
TAK, YOUNG JO;KIM, JAE KYUN;KIM, JUN YOUN;LEE, JAE WON;CHOI, HYO JI |
分类号 |
H01L33/12;H01L29/778;H01L33/32 |
主分类号 |
H01L33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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