发明名称 FILM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To allow the observation of an evaporation state for a long period of time in such a state that the influence by sticking or the like of a film deposition material is reduced.SOLUTION: In a film deposition apparatus, since a plurality of pipes 51 constituting a stain preventing part 50 are provided to extend along the optical axis O of a lens 22, the inside of each of the plurality of pipes 51 forms an optical path L along the optical axis O, and it is possible to image a state in the vicinity of a film deposition material Ma without narrowing the imaging area of the lens 22. Further, sticking of the film deposition material particles Mb to the lens 22 can be effectively prevented by providing the plurality of pipes 51 between the lens 22 and the imaging area. Furthermore, since the film deposition material particles Mb can prevent an obstruction of the field of vision by the lens 22, the evaporation state of the film deposition material can be observed for a long period of time in such a state that the influence by sticking or the like of the film deposition material is reduced.
申请公布号 JP2013253271(A) 申请公布日期 2013.12.19
申请号 JP20120128209 申请日期 2012.06.05
申请人 SUMITOMO HEAVY IND LTD 发明人 KITAMI NAOHISA
分类号 C23C14/52 主分类号 C23C14/52
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