发明名称 COMPOSITION AND METHOD FOR POLISHING MOLYBDENUM
摘要 The present invention provides compositions and methods for polishing a molybdenum metal-containing surface. A polishing composition (slurry) described herein comprises an abrasive concentration of an inorganic particulate abrasive material (e.g., alumina or silica) suspended in an acidic aqueous medium containing a water soluble surface active material and an oxidizing agent. The surface active material is selected based on the zeta potential of the particulate abrasive, such that when the abrasive has a positive zeta potential, the surface active material comprises a cationic material, and when the particulate abrasive has a negative zeta potential, the surface active material comprises an anionic material, a nonionic material, or a combination thereof.
申请公布号 WO2013188296(A1) 申请公布日期 2013.12.19
申请号 WO2013US44981 申请日期 2013.06.10
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 SINGH, PANKAJ;JONES, LAMON
分类号 C09K3/14 主分类号 C09K3/14
代理机构 代理人
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