发明名称 |
TEMPLATE FOR NANOIMPRINT AND PATTERN FORMATION METHOD USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a technology which reduces defects due to expansion failures of a transferred material when the transferred material supplied onto a transfer base material is placed in contact with a template to expand.SOLUTION: A template for nanoimprint includes: a first region 110 having a first pattern; and a second region 120, which is disposed spaced a predetermined distance away from a periphery of the first region 110 and has a second pattern, on one surface of a base material. The first pattern and the second pattern are linear patterns. A first direction that the first pattern extends and a second direction that the second pattern extends substantially correspond to each other. |
申请公布号 |
JP2013254913(A) |
申请公布日期 |
2013.12.19 |
申请号 |
JP20120131219 |
申请日期 |
2012.06.08 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
ITO KIMIO;NAKADA NAOKO;ARITSUKA YUKI |
分类号 |
H01L21/027;B29C33/38;B29C59/02;B81C1/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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