发明名称 TEMPLATE FOR NANOIMPRINT AND PATTERN FORMATION METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a technology which reduces defects due to expansion failures of a transferred material when the transferred material supplied onto a transfer base material is placed in contact with a template to expand.SOLUTION: A template for nanoimprint includes: a first region 110 having a first pattern; and a second region 120, which is disposed spaced a predetermined distance away from a periphery of the first region 110 and has a second pattern, on one surface of a base material. The first pattern and the second pattern are linear patterns. A first direction that the first pattern extends and a second direction that the second pattern extends substantially correspond to each other.
申请公布号 JP2013254913(A) 申请公布日期 2013.12.19
申请号 JP20120131219 申请日期 2012.06.08
申请人 DAINIPPON PRINTING CO LTD 发明人 ITO KIMIO;NAKADA NAOKO;ARITSUKA YUKI
分类号 H01L21/027;B29C33/38;B29C59/02;B81C1/00 主分类号 H01L21/027
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