发明名称 |
METHODS FOR TEXTURING A SEMICONDUCTOR MATERIAL |
摘要 |
<p>A method for modifying the texture of a semiconductor material is provided. The method includes performing a first texture step comprising reactive ion etching to a first surface of semiconductor material. After the first texture step, the first surface of the semiconductor material has a random texture comprising a plurality of peaks and a plurality of valleys, and wherein at least fifty percent of the first surface has a peak-to-valley height of less than one micron and an average peak-to-peak distance of less than one micron. Additional texture steps comprising wet etch or RIE etching may be optionally applied.</p> |
申请公布号 |
WO2013188218(A1) |
申请公布日期 |
2013.12.19 |
申请号 |
WO2013US44622 |
申请日期 |
2013.06.07 |
申请人 |
GTAT CORPORATION |
发明人 |
NEWMAN, BONNA;MURALI, VENKATESAN;LI, ZHIYONG;CHEN, LIANG |
分类号 |
H01L21/3065;H01L31/0236;H01L31/042 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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