发明名称 |
SUBSTRATE HAVING ETCHING MASK AND METHOD FOR PRODUCING SAME |
摘要 |
Provided are a substrate with an etching mask which enables high definition patterning and a method of manufacturing the same. A photosensitive material is applied on a surface of a substrate, exposure and development of the photosensitive material are carried out to form a resist pattern, a DLC coating film is formed on the surface of the substrate and a surface of the resist pattern, and the DLC coating film formed on the resist pattern is separated together with the resist pattern to form a DLC pattern on the surface of the substrate. |
申请公布号 |
US2013337231(A1) |
申请公布日期 |
2013.12.19 |
申请号 |
US201213980695 |
申请日期 |
2012.02.08 |
申请人 |
SHIGETA KAKU;SUGAWARA SHINTARO;SHIGETA TATSUO;THINK LABORATORY CO., LTD. |
发明人 |
SHIGETA KAKU;SUGAWARA SHINTARO;SHIGETA TATSUO |
分类号 |
G03F7/40 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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