| 发明名称 |
SUBSTRATE PLASMA-PROCESSING APPARATUS |
| 摘要 |
A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate. |
| 申请公布号 |
US2013337605(A1) |
申请公布日期 |
2013.12.19 |
| 申请号 |
US201313972497 |
申请日期 |
2013.08.21 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
KANG TAE-WOOK;KIM OU-HYUN;JL CHANG-SOON;CHO HYUN-LAE;AN CHANG-GUO;LEE JEONG-YEOL;PARK JAE-MORK |
| 分类号 |
H01L51/00 |
主分类号 |
H01L51/00 |
| 代理机构 |
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代理人 |
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