| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a resist composition that can give a resist pattern with small line edge roughness (LER).SOLUTION: A method for producing a resist pattern includes steps of: (1) applying a following resist composition on a substrate; (2) drying the applied resist composition to form a composition layer; (3) exposing the composition layer; (4) heating the exposed composition layer; and (5) developing the heated composition layer with a negative developing solution. The resist composition comprises: a resin (A1) having a structural unit expressed by formula (I) and a structural unit having an acid-labile group; a resin (A2) that includes a fluorine atom and is soluble in a negative developing solution; an acid generator; and a solvent. In the formula, Rrepresents an alkyl group having 1 to 6 carbon atoms, which may have a halogen atom, or the like; and ring Xrepresents a heterocycle having 2 to 36 carbon atoms. |
