SUBSTRATE SUPPORT MEDIUM AND SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate support medium which inhibits influences on an atmosphere gas around a substrate and achieves long life, and to provide a semiconductor manufacturing apparatus.SOLUTION: A substrate support medium according to this invention supports a substrate when a film is deposited on a surface of the substrate by a chemical vapor deposition method. The substrate support body includes: a graphite material having a recessed part for housing the substrate; a multilayer film formed in the recessed part by overlapping a first sublimation prevention film formed by TaC or HfC on a first degasification prevention film formed by SiC; and a second degasification prevention film formed by SiC in a portion of the graphite material which excludes the recessed part.