发明名称 COMPOUND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A first electrode, an intrinsic first compound semiconductor layer over the first electrode, a second compound semiconductor layer whose band gap is smaller than that of the first compound semiconductor layer on the first compound semiconductor layer, and a second electrode over the second compound semiconductor layer are provided.
申请公布号 US2013334540(A1) 申请公布日期 2013.12.19
申请号 US201313971921 申请日期 2013.08.21
申请人 FUJITSU LIMITED 发明人 IMADA TADAHIRO
分类号 H01L29/778;H01L29/66 主分类号 H01L29/778
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