发明名称 |
PHOTOMASK AND METHOD FOR FORMING THE SAME |
摘要 |
A photomask having a machine-readable identifying mark and suitable for manufacturing integrated circuit devices and a method for forming the photomask and identifying mark are disclosed. An exemplary embodiment includes receiving a design layout corresponding to a pattern to be formed on a photomask blank. A specification of an identifying code is also received along with the photomask blank, which includes a substrate, a reflective layer, and an absorptive layer. A first patterning is performed using the design layout. A second patterning is performed using the specification of the identifying code. |
申请公布号 |
US2013337370(A1) |
申请公布日期 |
2013.12.19 |
申请号 |
US201213495291 |
申请日期 |
2012.06.13 |
申请人 |
LEE HSIN-CHANG;HSU PEI-CHENG;CHEN CHIA-JEN;YEN ANTHONY;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LEE HSIN-CHANG;HSU PEI-CHENG;CHEN CHIA-JEN;YEN ANTHONY |
分类号 |
G03F1/44;G03F1/68;G03F1/76;G03F7/20 |
主分类号 |
G03F1/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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