An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.
申请公布号
WO2013147966(A3)
申请公布日期
2013.12.19
申请号
WO2013US20322
申请日期
2013.01.04
申请人
PRESIDENT AND FELLOWS OF HARVARD COLLEGE
发明人
LONCAR, MARKO;LUKIN, MIKHAIL D.;BUREK, MICHAEL J.;DE LEON, NATHALIE;SHIELDS, BRENDAN