发明名称 SEMICONDUCTOR DEVICE, AND PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 According to the present invention, a structure of a semiconductor device in which adhesive deposits are reduced and yield is excellent; and a process for manufacturing the same can be provided. A process for manufacturing a semiconductor device according to the present invention includes: a step of arranging plural semiconductor elements (106) on a main surface of a thermal release adhesive layer (mount film); a step of forming an encapsulant layer (108), which encapsulates the plural semiconductor elements (106) on the main surface of the mount film, using a semiconductor-encapsulating resin composition; and a step of peeling off the mount film to expose a lower surface (30) of the encapsulant layer (108) and lower surfaces (20) of the semiconductor elements (106). A contact angle of the lower surface (30) of the encapsulant layer (108) is less than or equal to 70° when measured using formamide after the step of peeling off the mount film.
申请公布号 US2013337608(A1) 申请公布日期 2013.12.19
申请号 US201214003404 申请日期 2012.03.09
申请人 KOTANI TAKAHIRO;MAEDA MASAKATSU;SUMITOMO BAKELITE CO., LTD. 发明人 KOTANI TAKAHIRO;MAEDA MASAKATSU
分类号 H01L21/56 主分类号 H01L21/56
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