| 摘要 |
<p>A chemical processing apparatus (S) is configured in such a manner that, in a process involving sending a chemical (L) to a shower nozzles (14) via a shower pipe (16) from a chemical tank (12), an additive solution (L2) is supplied to the chemical (L), which flows through the shower pipe (16), via an additive solution pipe (26) from an additive solution tank (25), and, after being supplied to the surface of a substrate being processed (W) from the shower nozzles (14), the chemical (L) is recovered in the chemical tank (12).</p> |
