| 摘要 |
<p>Combustion gas is introduced into a first processor (2) of a combustion gas processing device (1). The combustion gas is mixed with a first process liquid in a gas-liquid contact chamber (21) of the first processor (2), and is guided to a first gas processing chamber (22) while the flow rate thereof is increased by a guide unit (213). In the first gas processing chamber (22), the combustion gas introduced into the first process liquid is caused to flow through the first process liquid by the action of a first blower (41). Here, toxic substances and the like can be removed from the combustion gas by dissolving the toxic substances and the like from the combustion gas in the first processing liquid. Primary process gas that has flowed through the first process liquid is introduced into a second gas processing chamber (31) of a second processor (3). In the second gas processing chamber (31), the primary process gas is caused to flow through a second process liquid by the action of a second blower (42). Here, malodorous substances and the like can be removed from the primary process gas by dissolving the malodorous substances and the like from the primary process gas in the second process liquid.</p> |
