| 摘要 |
The purpose of the present invention is to improve the throughput of a substrate processing apparatus and prevent the contamination of a cleaning solution on the surface of a substrate for a supercritical dry process. The present invention include a liquid process part (29-36) for processing the substrate, a transfer hole (75) for receiving a dry substrate, a supercritical dry process part (37-44) for processing a dry process on the substrate (7) by using a supercritical fluid, a first substrate transfer part (13,14) moving the dry substrate (7) to the transfer hole (75) of the liquid process part (29-36), and a second substrate transfer part (49-52) moving a wet substrate (7) from the transfer hole (75) of the transfer hole (29-36) to the supercritical dry process part (37-44). |
