发明名称 POLYMER COMPOSITION FOR MICROELECTRONIC ASSEMBLY
摘要 Embodiments according to the present invention relate to sacrificial polymer compositions that include polycarbonate polymers having repeat units derived from stereospecific polycyclic 2,3-diol monomers. The sacrificial polymer compositions also include an acid generator that is selected from at least one photoacid generator and/or at least one thermal acid generator. In addition, embodiments according to the present invention relate to a method of forming a structure that includes a three-dimensional space interposed between a substrate and an overcoat layer, and a method of temporarily bonding first and second substrates together, which make use of the polycarbonate polymers.
申请公布号 KR20130138192(A) 申请公布日期 2013.12.18
申请号 KR20137005707 申请日期 2011.08.05
申请人 PROMERUS, LLC 发明人 APANIUS CHRISTOPHER;BELL ANDREW;LANGSDORF LEAH;TSANG W. C. PETER
分类号 C08L69/00;B23K35/26;B81C1/00;C08G64/02;C08K5/00;H05K3/34 主分类号 C08L69/00
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