| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method enabling an operator to perform maintenance of an exposure device rapidly and at proper timing. <P>SOLUTION: The substrate processing apparatus 500 includes: an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a development processing block 12, a resist cover film processing block 13, a resist cover film removal block 14 and an interface block 15. An exposure device 16 is arranged adjacent to the interface block 15. The interface block 15 includes first and second inspection units EE1 and EE2. The first inspection unit EE1 inspects the state of a substrate W before exposure processing, and the second inspection unit EE2 inspects the state of the substrate W after the exposure processing. <P>COPYRIGHT: (C)2010,JPO&INPIT |
