发明名称 Radiation-sensitive resin composition, polymer and compound
摘要 A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.
申请公布号 US8609321(B2) 申请公布日期 2013.12.17
申请号 US201313789701 申请日期 2013.03.08
申请人 JSR CORPORATION;JSP CORPORATION 发明人 NAKASHIMA HIROMITSU;KIMURA REIKO;NAKAHARA KAZUO;SATO MITSUO
分类号 G03F7/038;G03F7/039 主分类号 G03F7/038
代理机构 代理人
主权项
地址