发明名称 |
Radiation-sensitive resin composition, polymer and compound |
摘要 |
A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group. |
申请公布号 |
US8609321(B2) |
申请公布日期 |
2013.12.17 |
申请号 |
US201313789701 |
申请日期 |
2013.03.08 |
申请人 |
JSR CORPORATION;JSP CORPORATION |
发明人 |
NAKASHIMA HIROMITSU;KIMURA REIKO;NAKAHARA KAZUO;SATO MITSUO |
分类号 |
G03F7/038;G03F7/039 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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