| 发明名称 |
Photoacid generators and photoresists comprising same |
| 摘要 |
New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure -C(=O)N<. Photoresist compositions also are provided that comprise one or more PAGs of the invention. |
| 申请公布号 |
US8609891(B2) |
申请公布日期 |
2013.12.17 |
| 申请号 |
US201113095533 |
申请日期 |
2011.04.27 |
| 申请人 |
BAE YOUNG CHEOL;CARDOLACCIA THOMAS;LIU YI;ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BAE YOUNG CHEOL;CARDOLACCIA THOMAS;LIU YI |
| 分类号 |
G03F7/004;C07C309/04;C07C309/06;C07C309/13;G03F7/028;G03F7/26 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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