发明名称 EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 In exposed areas, since a returned film is heated slowly, a temperature difference between the top and bottom of the film occurs, thereby, wrinkles are formed in the film and light is not emitted at a desired angle to the surface of the film. The exposure apparatus includes a return unit which returns a rectangular film, an exposure unit which exposes the film returned by the return unit using a mask, and a cooling unit which cools the film exposed by the exposure unit by air cooling or liquid cooling. [Reference numerals] (AA) Up;(BB) Down stream;(CC) Up stream;(DD) Down
申请公布号 KR20130137526(A) 申请公布日期 2013.12.17
申请号 KR20130046331 申请日期 2013.04.25
申请人 ARISAWA MFG. CO., LTD. 发明人 SATO TATSUYA;URA KAZUHIRO;IMAYOSHI KOJI;YASUI RYOSUKE
分类号 G03F7/20;G03F7/26 主分类号 G03F7/20
代理机构 代理人
主权项
地址