发明名称 |
Method for forming multilayer structure, method for manufacturing display panel, and display panel |
摘要 |
A method for forming a multilayer includes a process for forming a first conductive layer on a substrate; a process for forming a first insulating layer on the first conductive layer; a process for forming a second conductive layer on the first insulating layer and patterning the deposited second conductive layer; a process for forming a second insulating layer over the substrate so as to cover the patterned the second conductive layer; a process for forming a third insulating layer on the second insulating layer, wherein an etching speed of the third insulating layer is faster than that of the second insulating layer; and a process for forming contact holes at once that expose at least a part of the first conductive layer to the first insulating layer, the second insulating layer and the third insulating layer. |
申请公布号 |
US8610871(B2) |
申请公布日期 |
2013.12.17 |
申请号 |
US20100690707 |
申请日期 |
2010.01.20 |
申请人 |
TANAKA YOSHITAKA;CHIKAMORI HIROYUKI;CASIO COMPUTER CO., LTD. |
发明人 |
TANAKA YOSHITAKA;CHIKAMORI HIROYUKI |
分类号 |
G02F1/13;H01L21/00 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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