发明名称 Gate-all-around carbon nanotube transistor with selectively doped spacers
摘要 A method of fabricating a semiconducting device is disclosed. A carbon nanotube is formed on a substrate. A portion of the substrate is removed to form a recess below a section of the carbon nanotube. A doped material is applied in the recess to fabricate the semiconducting device. The recess may be between one or more contacts formed on the substrate separated by a gap.
申请公布号 US8609481(B1) 申请公布日期 2013.12.17
申请号 US201213705920 申请日期 2012.12.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FRANKLIN AARON D.;KOSWATTA SIYURANGA O.;SMITH JOSHUA T.
分类号 H01L21/336 主分类号 H01L21/336
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