发明名称 Power semiconductor device and method for manufacturing same
摘要 According to one embodiment, a power semiconductor device includes a first semiconductor layer, and first, second and third semiconductor regions. The first semiconductor layer has a first conductivity type. The first semiconductor regions have a second conductivity type, and are formed with periodicity in a lateral direction in a second semiconductor layer of the first conductivity type. The second semiconductor layer is provided on a major surface of the first semiconductor layer in a device portion with a main current path formed in a vertical direction generally perpendicular to the major surface and in a terminal portion provided around the device portion. The second semiconductor region has the first conductivity type and is a portion of the second semiconductor layer sandwiched between adjacent ones of the first semiconductor regions. The third semiconductor regions have the second conductivity type and are provided below the first semiconductor regions in the terminal portion.
申请公布号 US8610210(B2) 申请公布日期 2013.12.17
申请号 US20100840201 申请日期 2010.07.20
申请人 OHTA HIROSHI;SUMI YASUTO;KIMURA KIYOSHI;SEKINE WATARU;SAITO WATARU;ONO SYOTARO;YABUZAKI MUNEHISA;HATANO NANA;WATANABE MIHO;KABUSHIKI KAISHA TOSHIBA 发明人 OHTA HIROSHI;SUMI YASUTO;KIMURA KIYOSHI;SEKINE WATARU;SAITO WATARU;ONO SYOTARO;YABUZAKI MUNEHISA;HATANO NANA;WATANABE MIHO
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
主权项
地址
您可能感兴趣的专利