CHEMICALLY AMPLIFIED RESIST COMPOSITION, RESIST FILM USING THE SAME, MASK BLANKS, AND RESIST PATTERN FORMING METHOD

摘要

A chemically amplified resist composition of the present invention comprises a structure unit (a) which generates acid by being decomposed by the emission of radiation or active rays, and a compound (α) including a phenolic hydroxyl group and an acidic cross-linking group. The compound including a phenolic hydroxyl group and an acidic cross-linking group contains at least one group selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group as the acidic cross-linking group.