发明名称 PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD.
摘要 <p>A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.</p>
申请公布号 NL2010849(A) 申请公布日期 2013.12.16
申请号 NL20132010849 申请日期 2013.05.23
申请人 ASML NETHERLANDS B.V. 发明人 PELLEMANS HENRICUS;ANTSIFEROV PAVEL;KRIVTSUN VLADIMIR;WIT JOHANNES;ZOUW GERBRAND;SMEETS RALPH
分类号 G03F7/20 主分类号 G03F7/20
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