发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM USING PHOTOSENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which makes physical properties of a film after curing comparable favorably with performance of a film cured at high temperature, a method for producing a patterned cured film using the resin composition and electronic components.SOLUTION: A resin composition is used as a photosensitive resin composition in the above problem. The resin composition contains (a) a polybenzoxazole precursor having a repeating unit represented by the general formula (I) (where U or V denotes a divalent organic group and at least one of U and V is a group including a 1-30C aliphatic chain structure), (b) a photosensitizing agent and (c) a solvent. |
申请公布号 |
JP2013250566(A) |
申请公布日期 |
2013.12.12 |
申请号 |
JP20130148919 |
申请日期 |
2013.07.17 |
申请人 |
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD |
发明人 |
IWASHITA KENICHI;NOKITA RIKA |
分类号 |
G03F7/023;C08G69/26;C08G73/22;G03F7/004 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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