EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus which inhibits the occurrence of exposure failures.SOLUTION: An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus includes: an optical member having a lower surface from which the exposure light is emitted; a first member supported by a first support member and spaced a first clearance away from the optical member; a second member that is supported by a second support member and is disposed at the outer side of the first member so as to be spaced a second clearance away from the first member; and a liquid supply port which is disposed in the second member so as to face the first member. A liquid supplied from the liquid supply port forms an immersion space of the liquid at the lower surface side of the optical member.