发明名称 TRENCH MOSFET WITH TRENCHED FLOATING GATES HAVING THICK TRENCH BOTTOM OXIDE AS TERMINATION
摘要 A power semiconductor power device having composite trench bottom oxide and multiple trench floating gates is disclosed. The gate charge is reduced by forming a pad oxide surrounding a HDP oxide on trench bottom. The multiple trenched floating gates are applied in termination for saving body mask.
申请公布号 US2013330892(A1) 申请公布日期 2013.12.12
申请号 US201313953026 申请日期 2013.07.29
申请人 HSIEH FU-YUAN;FORCE MOS TECHNOLOGY CO., LTD. 发明人 HSIEH FU-YUAN
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
主权项
地址