| 摘要 |
<p>A method for performing analysis of materials when present in a non- vacuum environment using an electron microscope, the method including generating first and second characteristic spectrum for a material by directing an electron beam from the electron microscope onto the material in respective first and second non-vacuum environments, in which respective first and second amounts of scattering of the electron beam takes place, collecting respective first and second X-rays emitted from the material and performing spectral analysis on the first and second X-rays, comparing the first and second characteristic spectra and noting peaks whose intensity increases with increased scattering, generating a scattering-compensated characteristic spectrum for the material from at least one of the first and second characteristic spectra by eliminating at least one peak whose intensity increases with increased scattering.</p> |
