发明名称 NANO-IMPRINT MOLD AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nano-imprint mold which has excellent dimensional accuracy of an irregular part of the nano-imprint mold including a fine irregular pattern and reduces the mold manufacturing costs, and to provide a manufacturing method of the nano-imprint mold.SOLUTION: A manufacturing method of a nano-imprint mold includes: a process where a substrate having a first main surface part formed by a plane surface is prepared; a resist pattern formation process where a protruding resist body is formed into a predetermined pattern on the first main surface part of the substrate directly or through an intermediate film; and a film part formation process where a coating film is deposited so as to cover a side surface and an upper surface of the protruding resist body, and the first main surface part of the substrate or an upper surface of the intermediate film.
申请公布号 JP2013251431(A) 申请公布日期 2013.12.12
申请号 JP20120125843 申请日期 2012.06.01
申请人 DAINIPPON PRINTING CO LTD 发明人 HIRAKA TAKAAKI;SAKAMOTO TAKESHI
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
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