发明名称 FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an organic EL device manufacturing device by which conveyance of a substrate can be conducted with the deposition surface up in a vacuum with a simple mechanism, and vapor deposition can be made with high definition even in the conveyance with the deposition surface up, a manufacturing method thereof, a film forming apparatus or a film forming method.SOLUTION: A substrate is conveyed in a vacuum with its vapor deposition surface up, and at least when the substrate moves, the conveyance surface of the substrate is held so as not to slide. The substrate is delivered in the vacuum chamber, and then the substrate is erected vertically or roughly vertically for vapor deposition. A plurality of the substrates that have been conveyed with the vapor deposition surface up are subjected to vapor deposition in one vacuum vapor deposition chamber alternately with the same vapor deposition source.
申请公布号 JP2013249545(A) 申请公布日期 2013.12.12
申请号 JP20130181062 申请日期 2013.09.02
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 WAKABAYASHI MASA;NIRASAWA NOBUHIRO;YUMIBA KENJI;OCHIAI YUKIO;ASADA MIKIO
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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