| 摘要 |
A barrier stack for protecting devices from the permeation of moisture and gases includes a first layer acting as a planarization, decoupling, and/or smoothing layer, a second layer acting as a plasma resistant protective layer over the first layer, and a third layer acting as a barrier layer over the second layer. The first layer includes a polymeric or organic material. The second layer includes an inorganic material or polymeric material. The third layer includes an inorganic material and has a different density and/or refractive index than the second layer. The barrier stack may further include a fourth layer acting as a tie layer between the first layer and the substrate. |
