| 摘要 |
<p>One aspect of the present invention comprises a nail polish removing composition that is essentially free of acetone and ethyl acetate, and is essentially free of odor. The composition includes at least one triester of glycerol and C2-C5 carboxylic acid, at least one C3-C5 glycol, at least one C4-C6 cyclic carbonate, and, optionally, at least one colorant. Another aspect of the present invention is a method of removing nail polish, comprising providing the nail polish removing composition; immersing an absorbent material in the composition, wherein the absorbent material absorbs the composition; contacting the absorbent material to nail polish for a time sufficient to plasticize the nail polish film; and removing the plasticized nail polish film by mechanically rubbing with the absorbent material, wherein the composition comprises one or more phases.</p> |
