发明名称 METHOD FOR RECYCLING ORGANIC RUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION
摘要 <p>The present invention is a method for recycling an organic ruthenium compound for chemical vapor deposition, wherein an unreacted organic ruthenium compound is extracted from a used starting material after a thin film formation process, said method comprising the following steps (a)-(c). (a) A modification step wherein the used starting material and a hydrogenation catalyst are brought into contact with each other in a hydrogen atmosphere, thereby hydrogenating an oxidized organic ruthenium compound in the used starting material. (b) An adsorption step wherein the used starting material and an adsorbent are brought into contact with each other, thereby removing impurities in the used starting material. (c) A restoration step wherein the used starting material is heated at a temperature that is lower than the decomposition temperature of the organic ruthenium compound by 10-100°C (inclusive) for 8 hours or more, thereby adjusting the ratio of the isomers of the organic ruthenium compound in the used starting material.</p>
申请公布号 WO2013183703(A1) 申请公布日期 2013.12.12
申请号 WO2013JP65682 申请日期 2013.06.06
申请人 TANAKA KIKINZOKU KOGYO K.K. 发明人 HARADA, RYOSUKE;NABEYA, SHUNICHI;SHIGETOMI, TOSHIYUKI;SAITO, MASAYUKI
分类号 C07F15/00;B01J23/44;C07C7/12;C07C7/163;C07C13/263;C07C13/42;C07C45/79;C07C45/85;C07C49/92 主分类号 C07F15/00
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